tantalum target/disk/Tantalum sputtering target

tantalum target/disk/Tantalum sputtering target Tantalum ,Niobium as the dominant products in the scope of rare metal new materials, including many sorts and grades of their metals, sheet, tube, wire ,rod ,crucible , target ,alloy and so on. Tantalum features high melting point , low vapor pressure , good cold processability ,excellent chemical stability , good resistance to corrosion , high dielectric constant ,in surface oxide film .widely used in many industries such as electronics ,metallurgy, chemical processing , hard alloy cutters , aerospace and aviation. Product name: Tantalum sputtering target Material: RO5200/RO5400/RO5252(Ta-2.5W), RO5255(Ta-10W) Size: Dia(50~400mm)*Thk(6~20mm) Purity: e99.95%(min) or Alloy Table 1: technology parameter Grade 3N, 3N5, 4N, with Ta 99.99%min Recrystallization 95%min Grain size ASTM 4 or finer Surface finish 16Rms max. or Ra 0.4 ( RMS64 or better) Flatness 0.1mm or 0.15% max Tolerance +/-0.010' on all dimensions Special requirements to be agreed on by the supplier and buyer of negotiation For more details please go to our website, and welcome to China to visit our company.